Grid generator for Electron Beam Lithography to cause chain scission or cross-linking of MMA / PMMA (Polymethylmethacrylate) depending on the gradation curve of the e-beam resist and electron dose absorbed by the e-beam resist to mask the substrate for corrosive etching.
X Start:
Y Start:
X Elements:
Y Elements:
X Length:
Y Length:
X Offset:
Y Offset:




Load xml from device:


Or paste .xml schema below:


generate .wav from .xml layer